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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Surface Passivation of InGaAs/InP p-i-n Photodiodes Using Epitaxial Regrowth of InP

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Braga, O. M. [1] ; Delfino, C. A. [1] ; Kawabata, R. M. S. [2] ; Pinto, L. D. [2] ; Vieira, G. S. [1] ; Pires, M. P. [3] ; Souza, P. L. [2] ; Marega, E. [4] ; Carlin, J. A. [5] ; Krishna, S. [6]
Total Authors: 10
[1] Inst Estudos Avancados IEAv, BR-12228001 Sao Jose Dos Campos - Brazil
[2] Pontificia Univ Catolica Rio de Janeiro, PUC Rio, CETUC, LabSem, BR-22451900 Rio de Janeiro - Brazil
[3] Univ Fed Rio de Janeiro, Inst Fis, BR-21941909 Rio De Janeiro - Brazil
[4] Univ Sao Paulo, Inst Fis, Campus Sao Carlos, BR-13566560 Sao Carlos - Brazil
[5] Ohio State Univ OSU, Inst Mat Res, Columbus, OH 43210 - USA
[6] Ohio State Univ OSU, Dept Elect & Comp Engn, Columbus, OH 43210 - USA
Total Affiliations: 6
Document type: Journal article
Source: IEEE SENSORS JOURNAL; v. 20, n. 16, p. 9234-9244, AUG.15, 2020.
Web of Science Citations: 0

The use of epitaxial regrowth of InP on lattice-matched In0.53Ga0.47 As for passivation of photodiodes lateral mesa surfaces is investigated. The effect of the regrown layer was examined by photoluminescence and dark current measurements and compared with results obtained with SiO2 and Al2O3 passivation layers. The integrated intensity of steady-state photoluminescence of InGaAs covered by InP increased by a factor between 15.5 and 58.9, depending on the excitation wavelength, denoting a strong reduction of nonradiative recombination. This reduction is expected to be the result of a strong reduction of intragap surface states. For the same photoluminescence measurements, both SiO2 and Al2O3 oxide passivation instead showed a reduction of the photoluminescence intensity. The dark currents of p-i-n photodiodes showed less striking results, a fact that we claim, probably is related to residual doping of the InP regrown layer. (AU)

FAPESP's process: 16/05516-3 - Development of fabrication process of focal plane arrays
Grantee:Gustavo Soares Vieira
Support type: Scholarships abroad - Research