| Full text | |
| Author(s): |
Gomes Oliveira, Lucas Pires
[1]
;
Ribeiro, Rafael Parra
[1]
;
Ribeiro Bortoleto, Jose Roberto
[1]
;
Cruz, Nilson Cristino
[1]
;
Rangel, Elidiane Cipriano
[1]
Total Authors: 5
|
| Affiliation: | [1] Univ Estadual Paulista UNESP, Inst Ciencia & Tecnol Sorocaba ICTS, Lab Plasmas Tecnol LaPTec, Av Tres Marco 511, BR-18087180 Sorocaba, SP - Brazil
Total Affiliations: 1
|
| Document type: | Journal article |
| Source: | MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 24, n. 1 2021. |
| Web of Science Citations: | 0 |
| Abstract | |
Recently, there has been growing interest in the incorporation of particles in plasma deposited thin films to creation of multifunctional surfaces. In this work a new hybrid methodology based on the plasma enhanced chemical vapor deposition (PECVD) of hexamethyldisiloxane combined to the reactive sputtering of TiO2 is proposed for the preparation of SiOxCyHz-TiO2 composite films. Specifically, the effect of the proportion of O-2 in the plasma environment on the morphology, chemical structure, elemental composition, wettability, thickness and surface roughness, of the films was studied. Agglomerates of TiO2 (16-83 mu m) were detected into the organosilicon matrix with the concentration of particulates growing with the percentage of oxygen in the feed. In general, there was elevation in the angle of contact of the surfaces as the oxygen supply increased. Interpretation is proposed in terms of the influence of the oxygen supply on the TiO2 sputtering rate and in the oxidation of plasma species. (AU) | |
| FAPESP's process: | 17/21034-1 - SiO2 -TiO2 and SiO2-TiO2/CeO2 Multifunctional Nanocomposite Films Deposited by a Hybrid Plasma Methodology |
| Grantee: | Elidiane Cipriano Rangel da Cruz |
| Support Opportunities: | Regular Research Grants |