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Fabrication and characterization of silicon nitride waveguides for mid-infrared applications

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Author(s):
de Oliveira, Emerson C. ; Gerosa, Rodrigo M. ; Phelan, Ciaran ; de Matos, Christiano J. S. ; IEEE
Total Authors: 5
Document type: Journal article
Source: 2019 SBFOTON INTERNATIONAL OPTICS AND PHOTONICS CONFERENCE (SBFOTON IOPC); v. N/A, p. 4-pg., 2019-01-01.
Abstract

This work describes the fabrication and characterization of silicon nitride waveguides for operation in the 2 mu m to 3 mu m range. Fabrication was carried out via PECVD and lithography techniques. Transmission losses were measured, with a tunable laser, to be similar to 20 dB between 2.0 mu m and 2.3 mu m, increasing to mu 30 dB between 2.3 mu m and 2.6 mu m. Beyond 2.8 mu m no transmission was detected, possibly due to the presence of hydrogen in the silicon nitride material (leading to absorption). Losses in the 2.0 mu m to 2.6 mu m range are believed to be a consequence of scattering, as the waveguides presented an RMS roughness of similar to 5 nm. Future work will focus on reducing these sources of absorption and scattering so that operation can be extended to the 4 mu m range. (AU)

FAPESP's process: 15/12734-4 - Design, production and characterization of optical waveguides for plasmid excitation in graphene
Grantee:Ciaran Phelan
Support Opportunities: Scholarships in Brazil - Post-Doctoral
FAPESP's process: 18/07276-5 - Mid- and far-infrared plasmonic biosensing with graphene
Grantee:Christiano José Santiago de Matos
Support Opportunities: Regular Research Grants
FAPESP's process: 15/11779-4 - Plasmonic and nonlinear effects in graphene coupled to optical waveguides
Grantee:Christiano José Santiago de Matos
Support Opportunities: Research Projects - Thematic Grants
FAPESP's process: 18/19736-0 - Automation of the MackGraphe photonics laboratory: creation of a library of control routines
Grantee:Rodrigo Mendes Gerosa
Support Opportunities: Scholarships in Brazil - Technical Training Program - Technical Training