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Synthesis of pure anatase phase TiO2 films without direct thermal control applied to the fabrication of optical structures

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Author(s):
Pellegrini, Paloma E. S. ; Leitao, Luana de Moraes ; Poma, Freddy Jara ; Cioldin, Frederico H. ; Nista, Silvia V. G. ; Moshkalev, Stanislav ; Hernandez-Figueroa, Hugo E.
Total Authors: 7
Document type: Journal article
Source: 2024 SBFOTON INTERNATIONAL OPTICS AND PHOTONICS CONFERENCE, SBFOTON IOPC 2024; v. N/A, p. 3-pg., 2024-01-01.
Abstract

This study develops a novel multi-step sputtering process to fabricate 150 nm thick TiO2 films in the pure anatase phase, overcoming challenges related to uncontrolled phase transitions during prolonged plasma exposure. By introducing a three-stage deposition approach with intervals, we achieve consistent phase purity and reproducibility. Raman spectroscopy and optical ellipsometry confirm the effectiveness of this method. The multi-step sputtering process is applied to the fabrication of TiO2 waveguides by thermal scanning probe lithography. (AU)

FAPESP's process: 22/11596-0 - Scientific EMU: acquisition of transmission and characterization equipment for ultra-high-speed data links
Grantee:Darli Augusto de Arruda Mello
Support Opportunities: Research Infrastructure Program - Scientific
FAPESP's process: 21/11380-5 - CPTEn - São Paulo Center for the Study of Energy Transition
Grantee:Luiz Carlos Pereira da Silva
Support Opportunities: Research Grants - Science Centers for Development
FAPESP's process: 21/00199-8 - SMART NEtworks and ServiceS for 2030 (SMARTNESS)
Grantee:Christian Rodolfo Esteve Rothenberg
Support Opportunities: Research Grants - Research Centers in Engineering Program