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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Real-time determination of the segregation strength of indium atoms in InGaAs layers grown by molecular-beam epitaxy

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Author(s):
Martini, S. ; Quivy, A. A. ; Silva, E. C. F. da ; Leite, J. R.
Total Authors: 4
Document type: Journal article
Source: Applied Physics Letters; v. 81, n. 15, p. 2863-2865, Oct. 2002.
Field of knowledge: Physical Sciences and Mathematics - Physics
Abstract

The surface segregation of indium (In) atoms was investigated during the growth of InGaAs layers by reflection high-energy electron diffraction (RHEED). We observed that the decay constant of the RHEED-oscillation amplitude during growth depends on the growth conditions and is related, in a very simple way, to the segregation coefficient of the In atoms in the InGaAs layers. (AU)

FAPESP's process: 98/12779-0 - Experimental and theoretical study of the epitaxial semiconductor nanostructures derived from III-V compounds
Grantee:Gennady Gusev
Support Opportunities: Research Projects - Thematic Grants