| Full text | |
| Author(s): |
Sequinel, T.
[1]
;
Garcia, I. G.
[1]
;
Tebcherani, S. M.
[2]
;
Kubaski, E. T.
[3]
;
Oliveira, L. H.
[1]
;
Siu Li, M.
[4]
;
Longo, E.
[1]
;
Varela, J. A.
[1]
Total Authors: 8
|
| Affiliation: | [1] UNESP, Inst Quim, BR-14800900 Araraquara, SP - Brazil
[2] UTFPR, Dept Prod Engn, BR-84016210 Ponta Grossa, PR - Brazil
[3] Itajara Minerios Ltda, BR-84010050 Ponta Grossa, PR - Brazil
[4] Univ Sao Paulo, Inst Fis, BR-13566590 Sao Carlos, SP - Brazil
Total Affiliations: 4
|
| Document type: | Journal article |
| Source: | Journal of Alloys and Compounds; v. 583, p. 488-491, JAN 15 2014. |
| Web of Science Citations: | 7 |
| Abstract | |
CCTO thin films were deposited on Pt(111)/Ti/SiO2/Si substrates using a chemical (polymeric precursor) and pressure method. Pressure effects on CCTO thin films were evaluated by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM) and optical properties which revealed that a pressure film (PF) is denser and more homogeneous than a chemical film (CF). Pressure also causes a decrease in the band gap and an increase in the photoluminescence (PL) emission of CCTO films which suggests that the pressure facilitates the displacement of Ti in the titanate clusters and the charge transference from TiO6 to {[}TiO5V0z], {[}TiO5V0z] to {[}CaO11V0z] and {[}TiO5V0z] to {[}CuO4](x). (C) 2013 Elsevier B. V. All rights reserved. (AU) | |
| FAPESP's process: | 09/11099-2 - PREPARATION AND CHARACTERIZATION OF CaCu3Ti4O12 THIN FILMS BY HIGH PRESSURE IM SILICON SUBSTRATE WITH DIFFERENT ELECTRODES |
| Grantee: | Thiago Sequinel |
| Support type: | Scholarships in Brazil - Doctorate |
| FAPESP's process: | 98/14324-0 - Multidisciplinary Center for Development of Ceramic Materials |
| Grantee: | Elson Longo da Silva |
| Support type: | Research Grants - Research, Innovation and Dissemination Centers - RIDC |