Taxa de crescimento de filmes de diamante CVD em superfícies de molibdênio

Oswaldo Kazushi Fujiy; Vladimir Jesus Trava-Airoldi; Evaldo José Corat; Marcelo Juni Ferreira; Amaurí Amorim; João Roberto Moro

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(Reference retrieved automatically from SciELO through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Growth rate of the CVD diamond films on molybdenum surfaces

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Author(s):	Oswaldo Kazushi Fujiy ; Vladimir Jesus Trava-Airoldi ^[2] ; Evaldo José Corat ^[3] ; Marcelo Juni Ferreira ^[4] ; Amaurí Amorim ^[5] ; João Roberto Moro ^[6] Total Authors: 6
Document type:	Journal article
Source:	Rem: Revista Escola de Minas; v. 60, n. 2, p. 227-231, 2007-06-00.
Abstract
The substrate preparation for CVD diamond growth is of basic importance due to several reasons. A new molybdenum substrate preparation method, the aluminum oxide abrasion jetting, is introduced and compared with the traditional ones. Raman Scattering Spectroscopy (RSS) and Scanning Electron Microscopy (SEM) characterize CVD diamond films. CVD diamond films of good quality and uniformity were obtained. The substrate preparation by aluminum oxide blasting allowed for a higher nucleation rate. (AU)

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