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(Reference retrieved automatically from SciELO through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Optimization of structural, dielectric and ferroelectric parameters of PZT thin films

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Author(s):
E. B. Araújo [1] ; J. A. Eiras [2]
Total Authors: 2
Affiliation:
[1] Universidade Federal de São Carlos. Departamento de Física. Grupo de Cerâmicas Ferroelétricas
[2] Universidade Federal de São Carlos. Departamento de Física. Grupo de Cerâmicas Ferroelétricas
Total Affiliations: 2
Document type: Journal article
Source: Cerâmica; v. 47, n. 301, p. 9-12, 2001-03-00.
Abstract

This work make synthesis of results obtained from PZT thin films processed by different ways to optimizes structural, dielectric and ferroelectric parameters. Films were prepared using conventional furnace and rapid thermal annealing (RTA). Results were compared and showing that films crystallized by RTA showed better crystallization, if compared with films crystallized by conventional furnace. Thus, better dielectric and ferroelectric parameters were also obtained, duplicating values of remanent polarization (Pr) and increasing substantially the dielectric constant (epsilon) of the films. (AU)