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Power source for thin film deposition by magnetron sputtering in kHz - measurement system: voltage, current and power

Grant number: 18/22595-0
Support Opportunities:Research Grants - Innovative Research in Small Business - PIPE
Duration: August 01, 2019 - February 28, 2021
Field of knowledge:Engineering - Materials and Metallurgical Engineering
Principal Investigator:Wagner Henrique Rabelo
Grantee:Wagner Henrique Rabelo
Host Company:Intersecta Engenharia Ltda
CNAE: Fabricação de equipamentos e aparelhos elétricos não especificados anteriormente
City: Sorocaba
Associated researchers:José Roberto Ribeiro Bortoleto ; Luís Filipe de Moura Santos
Associated scholarship(s):19/20980-6 - Power source for thin film deposition by magnetron sputtering in kHz: measurement system for voltage, current and power, BP.PIPE


The project consists on the conclusion of a commercial prototype of a power source (300W), alternate current (600 VAC), operating from 10 to 40 kHz, responsible for the initialization and electric field support used for the plasma generation. This source will be used for a thin film deposition through a magnetron sputtering technique being an alternative technology in radio frequency, currently used in large scale in Brasil, which has a higher cost. (AU)

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