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Films deposition and surface modification using plasma immersion with pulsed bias on the substrate holder between 0 and 20 kV


In this project we propose initially to produce hard DLC films on silicon, doing carbon implantation into the surface, to create an interface of about 100 nm, obtaining excellent adhesion between film and substrate. The original aspect for this part of the project is to previously estimate the ion implantation depth and implanted carbon concentration in the substrate using numerical simulation by the software TRIDYN. A second goal for this project is to create and study DLC films with nanoparticles incorporated in them, obtaining a composite metal / insulator. The proposal is to deposit these films using two different methodologies. The first one is a codeposition of carbon and gold, using two plasma guns, pulsing alternately. The second method is to deposit a set of carbon films, alternating with gold ion implantation. For this last method the numerical simulation by TRIDYN will be also used. The films will be characterized by RBS, small angle X-ray scattering, nanoindentation, scanning electron microscopy and atomic force microscopy. The final goal will be to identify the structural difference between the DLC composites with gold nanoparticles incorporated, obtained through both methodologies, to compare them mechanical properties and to understand the mechanisms that generated the composites distinctions. (AU)

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