Alumina film deposition assisted by plasma immersion ion implantation

• Grant number: 09/07604-3
• Support Opportunities: Regular Research Grants
• Start date: September 01, 2009
• End date: August 31, 2011
• Field of knowledge: Physical Sciences and Mathematics - Physics - Physics of Fluids, Plasma Physics and Electrical Discharge
• Principal Investigator: Elidiane Cipriano Rangel da Cruz
• Grantee: Elidiane Cipriano Rangel da Cruz
• Host Institution: Universidade Estadual Paulista (UNESP). Campus Experimental de Sorocaba. Sorocaba , SP, Brazil

Abstract

The main objective of this work is to investigate the deposition conditions which induce the precipitation of crystalline phases in aluminum oxide films at reduced temperatures. The depositions will be performed in low pressure plasmas from trimethylaluminum, oxygen and argon mixtures associating resistive warming and ion bombardment. The study will be developed in two parts. In the first one, the glow discharge will be excited by the application of radiofrequency (13.56 MHz) signal to the warmed sample holder. Varying the oxygen to argon proportions and keeping the total gas pressure constant, it will be investigated the influence of the plasma composition on the film properties. The effect of the plasma power and deposition temperature will be also accessed. In the second part of the work it will be evaluated the effect of the substrate temperature and high energy ion bombardment on the film properties. In this case the plasma will be excited through the topmost electrode whereas biasing the warmed sample holder with high voltage negative pulses. To determine the lowest temperature which induces crystalline phase formation, the magnitude and frequency of the pulses will be varied as well as the deposition temperature. Analysis to investigate the presence of organic groups will be performed using infrared spectroscopy whereas hardness will be measured by nanoindentation tests. The morphology and roughness of the films will be determined by scanning electron and atomic force microscopies, respectively. The presence of crystalline phases will be evaluated by X-ray diffraction experiments and its proportion by the Rietveld method. (AU)

Scientific publications

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

DARRIBA BATTAGLIN, FELIPE AUGUSTO; HOSOKAWA, RICARDO SHINDI; DA CRUZ, NILSON CRISTINO; CASELI, LUCIANO; RANGEL, ELIDIANE CIPRIANO; DA SILVA, TIAGO FIORINI; TABACNIKS, MANFREDO HARRI. Innovative low temperature plasma approach for deposition of alumina films. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 17, n. 6, p. 1410-1419, NOV-DEC 2014. (12/14708-2, 09/07604-3)