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Effects of ion implantation on complex amorphous thin films produced by plasma enhanced chemical vapor deposition (PECVD)


Plasma enhanced chemical vapor depsition (PECVD) will be used to produce thin films from monomers such as chlorobenzene, or monomers with comonomers such as hexamethyldisiloxane and sulfur hexafluoride. The chemical structure and composition of the films as well as their optical properties will be investigated as a function of the system parameters such as the pressure and applied power or the proportion of comonomer in the chamber feed. The effects of ion implantation by immersion in plasmas of helium, argon or similar elements on these properties will also be investigated. The chemical structures will be examined by methods such as infrared spectroscopy and x-ray photoelectron spectroscopy. Support for the purchase of a spectrophotometer that operates in the 190 to 3300 nm region (ultraviolet-visible-near infrared) is sought. From spectral data in this region, the refractive index, and the coefficients of absorption and of extinction of the films will be obtained. The dependencies of the optical properties on he chemical structure and composition will be outlined and interpreted using molecular modeling. (AU)

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