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Characterization of thin amorphous films produced by chemical vapor deposition

Abstract

Additional material to permit the construction of a system for the Chemical Vapor Deposition of thin films is solicited. The system will consist of a vacuum chamber fitted with electrodes fed rf power, and fed gases via precision mass flow controllers. Series of a-C:N:H and a-C:O:H films will be deposited and their chemical composition and structure examined together with their mechanical and optical properties. Fundamental studies of films deposited from vapors of acetone and ether are also proposed. (AU)

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VEICULO: TITULO (DATA)
VEICULO: TITULO (DATA)