Silicon nitride etching in high - and low - density plasmas using sf6/02/n2 mixtures

• Grant number: 03/02530-5
• Support Opportunities: Regular Research Grants - Publications - Scientific article
• Start date: November 01, 2003
• End date: January 31, 2004
• Field of knowledge: Engineering - Electrical Engineering - Electrical Materials
• Principal Investigator: Jacobus Willibrordus Swart
• Grantee: Jacobus Willibrordus Swart
• Host Institution: Faculdade de Engenharia Elétrica e de Computação (FEEC). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil