1) analysis of the etch rate limiting steps in dry etching of tungsten in fluorine containing plasmas. 2) the influence of as over pressure on sn rapid thermal diffusion from sog into gaas.

• Grant number: 94/00582-7
• Support Opportunities: Research Grants - Meeting - Abroad
• Start date: May 22, 1994
• End date: May 27, 1994
• Field of knowledge: Engineering - Electrical Engineering - Electrical Materials
• Principal Investigator: Jacobus Willibrordus Swart
• Grantee: Jacobus Willibrordus Swart
• Host Institution: Faculdade de Engenharia Elétrica e de Computação (FEEC). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil