Study of growth, crystallization and surface structure of thin films, multilayers and nanostructures obtained by the atomic layer deposition method

• Grant number: 09/09027-3
• Support Opportunities: Research Grants - Young Investigators Grants
• Start date: December 01, 2009
• End date: October 31, 2011
• Field of knowledge: Physical Sciences and Mathematics - Physics - Condensed Matter Physics
• Principal Investigator: Angelo Malachias de Souza
• Grantee: Angelo Malachias de Souza
• Host Institution: Associação Brasileira de Tecnologia de Luz Síncrotron (ABTLuS). Ministério da Ciência, Tecnologia e Inovação (Brasil). Campinas , SP, Brazil
• Associated research grant(s): 10/18548-4 - Synchrotron radiation study on the growth of al and in nitride nanostructures and thin films by Atomic Layer Deposition, AV.BR

Abstract

This project will establish a new research topic on the assembly and structural studies of thin films and nanoparticles grown by the Atomic Layer Deposition (ALD) method. Our main intention is to initiate a new group on synthesis of materials that will potentially become a reference on the use of this technique, still unexplored inside the state of São Paulo and in Brazil. In particular, we are interested in two classes of materials: i) oxides with high dielectric constant and magnetic oxides and; ii) semiconductor nitrides. New results in basic and applied science will be also obtained by the proposed development of an in-situ growth camber for use in the x-ray diffraction and x-ray absorption beamlines. Such chamber will allow for quantitative understanding of growth and crystallization processes of thin films and nanostructures. ALD characteristics such as the novelty of the material synthesis route, the easiness of use, the absence of chamber contamination and low operational cost of the reactor will be useful to foment a wide spectrum of the internal research inside the Brazilian Synchrotron Light Laboratory. (AU)

Scientific publications

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

DE PAULI, M.; MALACHIAS, A.; WESTFAHL, JR., H.; BETTINI, J.; RAMIREZ, A.; HUANG, G. S.; MEI, Y. F.; SCHMIDT, O. G.. Study of roughness evolution and layer stacking faults in short-period atomic layer deposited HfO2/Al2O3 multilayers. Journal of Applied Physics, v. 109, n. 6, MAR 15 2011. (09/11875-2, 09/09027-3)

DE PAULI, MURIEL; MATOS, MATHEUS J. S.; SILES, PABLO F.; PRADO, MARIANA C.; NEVES, BERNARDO R. A.; FERREIRA, SUKARNO O.; MAZZONI, MARIO S. C.; MALACHIAS, ANGELO. Chemical Stabilization and Improved Thermal Resilience of Molecular Arrangements: Possible Formation of a Surface Network of Bonds by Multiple Pulse Atomic Layer Deposition. Journal of Physical Chemistry B, v. 118, n. 32, p. 9792-9799, AUG 14 2014. (09/09027-3)

SILES, PABLO F.; DE PAULI, MURIEL; BOF BUFON, CARLOS CESAR; FERREIRA, SUKARNO O.; BETTINI, JEFFERSON; SCHMIDT, OLIVER G.; MALACHIAS, ANGELO. Tuning resistive switching on single-pulse doped multilayer memristors. Nanotechnology, v. 24, n. 3, JAN 25 2013. (09/09027-3, 10/18548-4)