Low Energy Ion Implantation into Polymers to Develop Conductive Composites Layers for Lithography

• Grant number: 08/04986-0
• Support Opportunities: Scholarships in Brazil - Doctorate
• Start date: June 01, 2009
• End date: October 31, 2009
• Field of knowledge: Engineering - Electrical Engineering - Electrical Materials
• Principal Investigator: Maria Cecília Barbosa da Silveira Salvadori
• Grantee: Fernanda de Sá Teixeira
• Host Institution: Escola Politécnica (EP). Universidade de São Paulo (USP). São Paulo , SP, Brazil

Abstract

Plastic electronics is a new research area which can be an economical substitute to current silicon based technologies. Polymers with embedded metal particles exhibit very interesting electrical, magnetic and optical properties and have been produced by a broad range of different techniques. Metal plasma implantation is one of the methods to produce conducting composites. In this work it will be used low energy gold and platinum plasma formed by a cathodic plasma source in vacuum to ion implant on PMMA and SU-8. These materials are important polymers since they are largely used as resist in lithography by electron beam, X-ray, ions and deep-UV radiations. It is expected that the metal ion implantation, with low energy, on PMMA and SU-8 generates nanometric layer of conducting composites. This new material, named insulating-conductor composite, will allow creating multi layered patterns for micro and nanodevices. Electrical measurements will be performed in situ as function of the metal ion doses in order to study transport properties of these new materials. TRIDYN simulations will be performed to obtain the implantation depth and profile. Finally the conducting composites will be characterized to verify if they maintain the original lithographic properties of the PMMA and SU-8.

Academic Publications

(References retrieved automatically from State of São Paulo Research Institutions)

TEIXEIRA, Fernanda de Sá. Low energy ion implantation into polymers to develop conductive composite layers for lithography.. 2010. Doctoral Thesis - Universidade de São Paulo (USP). Escola Politécnica (EP/BC) São Paulo.