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| Author(s): |
Fernanda de Sá Teixeira
Total Authors: 1
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| Document type: | Doctoral Thesis |
| Press: | São Paulo. |
| Institution: | Universidade de São Paulo (USP). Escola Politécnica (EP/BC) |
| Defense date: | 2010-06-28 |
| Examining board members: |
Maria Cecília Barbosa da Silveira Salvadori;
Sérgio Luiz Morelhão;
Stanislav Moshkalev;
Sebastião Gomes dos Santos Filho;
Luís da Silva Zambom
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| Advisor: | Maria Cecília Barbosa da Silveira Salvadori; Mauro Sergio Dorsa Cattani |
| Abstract | |
Electronics using polymers instead of silicon is a recent research area with promising economic perspectives. Polymer with metallic particles composites presents interesting electrical, magnetic and optical properties and they have been produced by a broad variety of techniques. Metal ion implantation using plasma is one of the used methods to obtain conductor composites. In this work it is performed low energy gold ion implantation in PMMA by using plasma. PMMA has great technological importance once it is broadly used as resist in electron-beam, X-ray, ion and deep UV lithography. As a result of low energy ion implantation in PMMA, a nanometric conducting layer is formed. This new material, named insulator-conductor composite, can allow the creation of micro and nanodevices through well known microelectronics techniques. Electrical measurements are performed in situ as a function of metal ions implanted dose, which allows the investigation of electrical transport of these new materials, which can be modeled by the percolation theory. Simulations using TRIDYN computer code provide the prediction of depth profile of implanted ions. Important characterizations are showed such as Transmission Electron Microscopy, Scanning Tunneling Microscopy, Small Angle X-Ray Scattering, X-Ray Diffraction and UV-vis Spectroscopy. These techniques allow to visualize and to investigate the nanostructured character of the metal-polymer composite. Still as a part of this project, the conducting layers formed are characterized in relation to the maintenance of their characteristics as electron-beam resist. (AU) | |
| FAPESP's process: | 08/04986-0 - Low Energy Ion Implantation into Polymers to Develop Conductive Composites Layers for Lithography |
| Grantee: | Fernanda de Sá Teixeira |
| Support Opportunities: | Scholarships in Brazil - Doctorate |