The effect of the chemical composition of supports on the nanostructuring of polymeric films deposited by means of spin-coating

• Grant number: 12/03421-4
• Support Opportunities: Scholarships in Brazil - Scientific Initiation
• Start date: April 01, 2012
• End date: August 31, 2012
• Field of knowledge: Physical Sciences and Mathematics - Chemistry - Physical-Chemistry
• Principal Investigator: Denise Freitas Siqueira Petri
• Grantee: Bruno Cesar Burin
• Host Institution: Instituto de Química (IQ). Universidade de São Paulo (USP). São Paulo , SP, Brazil

Abstract

In this project the effect of the chemical composition of solid supports on the nanostructuring of polymeric films deposited under high relative humidity will be investigated. Solutions of poly(methyl methacrylate) (PMMA), cellulose acetate butyrate (CAB) and carboxymethylcellulose acetate butyrate (CMCAB)prepared in tetrahydrofuran (THF) will be deposited onto bare Si wafers and onto modified Si wafers. The Si wafers will be silanized with aminopropyltriethoxysilane (APS) or trimethylchlorsilane (TMCS). The nanostructured films will be characterized by means of ellipsometry, contact angle measurements and atomic force microscopy (AFM). The nanostructured films will be used as templates for the deposition of metallic particles. (AU)