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Testing and application of a new type of ion implanter

Grant number: 13/10224-3
Support type:Scholarships in Brazil - Doctorate (Direct)
Effective date (Start): August 01, 2013
Effective date (End): July 31, 2016
Field of knowledge:Engineering - Materials and Metallurgical Engineering
Principal Investigator:Maria Cecília Barbosa da Silveira Salvadori
Grantee:Roman Spirin
Home Institution: Instituto de Física (IF). Universidade de São Paulo (USP). São Paulo , SP, Brazil
Associated research grant:08/57706-4 - National Institute of Science and Technology on Organic Electronics (INEO), AP.TEM


Roman Sperin is in course with his PhD project since March 2012. The student participated in the development of a new type of ion implanter that was part of a FAPESP project already concluded. Spirin has already partially characterized the new equipment and the present proposal is its final testing, including also the use of an application of the implanter in materials science. The objective of the tests are verifying if the ion beam is a neutral beam, which enables ion implantation into insulating samples, without accumulating positive charges, which would lead the sample to a different potential than planned. Thus, we propose to perform ion implantations, using the new implanter, at different energies, into insulating samples. The objective is to measure the depth profile of the implantation and compare with numerical simulations performed by TRIDYN. The methods of the samples characterization will be via RBS (Rutherford Backscattering Spectrometry), high-resolution scanning electron microscopy (Field Emission Gun Scanning Electron Microscopy) and transmission electron microscopy. The application of the implanter in materials science will be accomplished by surface modification of ceramic material, specifically titanium implantation into alumina in order to control the electrical conductivity of the surface. The results will be compared with theoretical model from the literature and previous works of the group. A possible application for this conductive ceramic surface will be of interest for particle accelerators and high-voltage insulators. (AU)

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