|Support type:||Scholarships in Brazil - Doctorate|
|Effective date (Start):||October 01, 2015|
|Effective date (End):||January 31, 2018|
|Field of knowledge:||Health Sciences - Dentistry - Dental Materials|
|Principal Investigator:||Andréa Cândido dos Reis|
|Grantee:||Denise Tornavoi de Castro|
|Home Institution:||Faculdade de Odontologia de Ribeirão Preto (FORP). Universidade de São Paulo (USP). Ribeirão Preto , SP, Brazil|
Biofilm formation on the surfaces of prosthetic devices plays an important role in development of various oral diseases. One way of overcome this problem is through the development of antimicrobial acrylic resins. The objective of this study is to propose different methods of incorporations nanostructured silver vanadate (²-AgVO3) in dental acrylic resin. Will be evaluated the standard promoted by incorporation proposed methods, the mechanical performance, antimicrobial capacity, release rate of the silver (Ag) and vanadium (V) ions and the biocompatibility of the resulting materials. The ²-AgVO3 be incorporated into the resin in the fractions of 0 - 5% by weight by three methods (I) through the use of a sonicator under different conditions of time and power, (II) the complete solubilization of the polymer before adding the nanomaterial fractions and (III) by pre-mix the polymer with ²-AgVO3 using a twin screw extruder. The physicochemical characterization of the specimens will be performed by scanning electron microscopy and microanalysis (SEM / EDS)and X-ray diffraction (XRD). The mechanical performance will be evaluated for resistance flexural and impact tests and antimicrobial capacity by biomolecular methods of PCR and genetic sequencing.The release rate of Ag and V elements will be analyzed by mass spectrometry with inductively coupled plasma (ICP-MS. The biocompatibility will be evaluated by histochemical method MTT with epithelial cells by human palate. The data will be statistically analyzed with normality and homogeneity tests to define the use of parametric or non-parametric analysis.