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The effect of ORMOSIL-QAMS add to a composite resin on bacterial adherence

Grant number: 15/24234-6
Support Opportunities:Scholarships in Brazil - Scientific Initiation
Effective date (Start): January 01, 2016
Effective date (End): December 31, 2016
Field of knowledge:Health Sciences - Dentistry - Dental Clinics
Principal Investigator:Flávio Henrique Baggio Aguiar
Grantee:Bianca de Camargo
Host Institution: Faculdade de Odontologia de Piracicaba (FOP). Universidade Estadual de Campinas (UNICAMP). Piracicaba , SP, Brazil

Abstract

In many situations, the dental material used in the oral cavity can cause accumulation of dental biofilm on its surface. Among them, the composite resins are probable the most important. To decrease the adhesion or improve the properties, different chemical functional groups have been added to resins, particularly targeting some antimicrobial effect. Thus, the objective of this study is to evaluate the effect of the application of two layers of ORMOSIL-QAMS (a hybrid material of type inter-penetrant network of organically modified silicate by adding quaternary ammonium silicate or metacrylox-QAMS-GROUP 2) on the resin Z350 XT (Group 1), in the adherence of Streptococcus mutans UA159. The adherence of will be evaluated on specimens made with the resins. These samples will be previously stored 3 months in sterilized artificial saliva. The S. mutans biofilm will be formed by the addition of these specimens in BHI containing 1% sucrose, in microaerophilic condition (10% CO2, 37oC), with 106 UFC/ml. After 1 day (time 1) and 5 days (time 2) biofilm growth, microorganisms will be counted and the samples will be subjected to scanning electron microscopy (SEM) to examine the profile of colonization. During the period, the culture medium will be completed every 24 hours. The data obtained will be submitted initially to the distribution analysis (Shapiro-Wilk test) and homoscedasticity of variances (Bartlett), using either parametric tests (one-way ANOVA/Tukey) or non-parametric test (Kruskal-Wallis/Dunn).

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