Development of an electron beam irradiation system and its application in the modification of semiconductor and non-metallic materials

Author(s)

João Paulo de Campos da Costa

• Document type: Doctoral Thesis
• Press: São Carlos.
• Institution: Universidade de São Paulo (USP). Escola de Engenharia de São Carlos (EESC/SBD)
• Defense date: 2023-02-08

Examining board members

Emiliano Rezende Martins; Marco Roberto Cavallari; Adenilson José Chiquito; Paulo Mateus Mendes; Antonio Carlos Seabra

• Advisor: João Paulo Pereira do Carmo; Elson Longo da Silva

Abstract

In the last years, advances and developments in technology have resulted in a significant increase in demand for new materials whose properties and functions can be manipulated through controlled application of light or electrons. In particular, electron beam interactions through transmission electron microscopy with matter have been extensively used not only as platforms for characterizing morphology, structure and chemical transformation, but also as a technique for processing and fabrication of new materials. However, it is still a challenge in the field of material processing to make production scalable and viable with a cost-effective and easy manufacturing procedure. For this reason, the elaboration and development of a new electron beam irradiation equipment now adds a differential for the production and modification of materials. In this new irradiation platform, the reactions are no longer performed with the aid of electron microscopes and are applied directly in various fields of scientific research, such as catalysis, photocatalysis, sensors, antimicrobial agents, magnetic materials, antitumor, among others. The main objective of this project is the development and manufacture of a new electron beam irradiation system with the intention of obtaining/modifying, or inducing new mechanical, chemical and processability properties of semiconductor and non-metallic materials. As a result of this irradiation platform, we aim to optimize the final material of interest for scientific and technological applications. The results obtained demonstrate the relevance and contribution of this equipment, which adds a high level of commercial and technological value to materials processing. Additionally, the equipment provides easy operation and control of irradiation process parameters, high precision, reproducibility, and the ability to create novel materials and structures that cannot be obtained by conventional methods. (AU)

• FAPESP's process: 19/18656-6 - Development of electron beam irradiation system and its application in the modification of semiconductor materials
• Grantee: João Paulo de Campos da Costa
• Support Opportunities: Scholarships in Brazil - Doctorate