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Development of electron beam irradiation system and its application in the modification of semiconductor materials

Grant number: 19/18656-6
Support type:Scholarships in Brazil - Doctorate
Effective date (Start): November 01, 2020
Effective date (End): October 31, 2023
Field of knowledge:Engineering - Electrical Engineering - Electrical, Magnetic and Electronic Measurements, Instrumentation
Principal Investigator:João Paulo Pereira Do Carmo
Grantee:João Paulo de Campos da Costa
Home Institution: Escola de Engenharia de São Carlos (EESC). Universidade de São Paulo (USP). São Carlos , SP, Brazil
Associated research grant:13/07296-2 - CDMF - Center for the Development of Functional Materials, AP.CEPID

Abstract

In the last years, advances and developments in technology have resulted in a significant increase in demand for new materials whose properties and functions can be manipulated through controlled application of light or electrons. In particular, electron beam interactions through transmission electron microscopy with matter have been extensively used not only as platforms for characterizing morphology, structure and chemical transformation, but also as a technique for processing and fabricating new materials. However, it is still a challenge in the field of material processing to make production scalable and viable with a cost-effective and easy manufacturing procedure. For this reason, the elaboration and development of a new electron beam irradiation equipment now adds a differential for the production and modification of materials. In this new irradiation platform, the reactions are no longer performed with the aid of electron microscopes and are applied directly in various fields of scientific research, such as catalysis, photocatalysis, sensors, antimicrobial agents, magnetic materials, antitumor, among others. . The main objective of this project is the development and manufacture of a new electron beam irradiation system with the intention of obtaining/modifying, or inducing new mechanical, chemical and processability properties of semiconductor materials. As a result of this irradiation platform, we aim to optimize the final material of interest for scientific and technological applications. (AU)

Scientific publications
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
DE CAMPOS DA COSTA, JOAO PAULO; ASSIS, MARCELO; TEODORO, VINICIUS; RODRIGUES, ANDRE; DE FOGGI, CAMILA CRISTINA; SAN-MIGUEL, MIGUEL ANGEL; PEREIRA DO CARMO, JOAO PAULO; ANDRES, JUAN; LONGO, ELSON. Electron beam irradiation for the formation of thick Ag film on Ag3PO4. RSC ADVANCES, v. 10, n. 37, p. 21745-21753, JUN 9 2020. Web of Science Citations: 0.

Please report errors in scientific publications list by writing to: cdi@fapesp.br.