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Author(s):
Deilton Reis Martins
Total Authors: 1
Document type: Master's Dissertation
Press: São Paulo. , gráficos, ilustrações, tabelas.
Institution: Universidade de São Paulo (USP). Escola Politécnica (EP/BC)
Defense date:
Examining board members:
Maria Cecilia Barbosa da Silveira Salvadori; Mauro Sergio Dorsa Cattani; Ronaldo Domingues Mansano
Advisor: Maria Cecilia Barbosa da Silveira Salvadori
Field of knowledge: Physical Sciences and Mathematics - Physics
Indexed in: Banco de Dados Bibliográficos da USP-DEDALUS
Location: Universidade de São Paulo. Biblioteca Central da Escola Politécnica; EPBC/FD-3122
Abstract

In this work thin films are obtained from plasma generated by electric current. This process, known as filtered cathodic arc, is largely used in technological applications as to coat or modify surfaces. We present a description of this method and details of the equipment construction, like the electric circuit for generation of the cathodic arc. After the equipment construction we begin to study the films contamination in function of previous elements used in the deposition chamber, that is, contamination study by memory effect. As part of this memory effect study, we analyzed the problem of the persistence of this effect during the deposition process. Finally, results are presented about oxygen contamination of aluminum films. (AU)