| Office | CIPO |
| Document type: | Patent |
| Inventor(s): | Luiz Gonçalves Neto; Ronaldo Domingues Mansano; Giuseppe Antonio Cirino; Luis Da Silva Zambom |
| Applicant: | Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP); Universidade de São Paulo (USP). |
| Year: | 2002 |
| Application Number: | CA 2458299 |
| IPC: | C23C 14/06 C23C 14/34 C23C 16/26 |
The present invention concerns an improved process for the deposition of amorphous hydrogenated carbon film, more specifically an improved low temperature, low power and low vacuum cathodic sputtering process. The invention also concerns the film produced by said process and articles containing an amorphous hydrogenated carbon film coating.
| Grantee: | Ronaldo Domingues Mansano |
| Principal Investigator: | Ronaldo Domingues Mansano |
| Institution: | Universidade de São Paulo (USP). Escola de Engenharia de São Carlos (EESC) |
| Support Opportunities: | Research Grants - Support for Intellectual Property Rights and Licensing (PAPI/Nuplitec) |