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(Reference retrieved automatically from SciELO through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Morphological and electrical evolution of ZnO: Al thin filmsdeposited by RF magnetron sputtering onto glass substrates

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Author(s):
Érica Pereira da Silva [1] ; Michel Chaves [2] ; Steven Frederick Durrant [3] ; Paulo Noronha Lisboa-Filho [4] ; José Roberto Ribeiro Bortoleto [5]
Total Authors: 5
Affiliation:
[1] São Paulo State University. Technological Plasmas Laboratory - Brasil
[2] São Paulo State University. Technological Plasmas Laboratory - Brasil
[3] São Paulo State University. Technological Plasmas Laboratory - Brasil
[4] São Paulo State University - Brasil
[5] São Paulo State University. Technological Plasmas Laboratory - Brasil
Total Affiliations: 5
Document type: Journal article
Source: MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS; v. 17, n. 6, p. 1384-1390, 2014-12-00.
Abstract

In this work, the surface and electrical characteristics ZnO:Al thin films deposited by RF magnetron sputtering onto glass substrates have been investigated. Analysis of surface morphologies revealed two growth stages. In the first stage, up to thicknesses of 100 nm, the films show surface structures with a granular form without preferential orientation. Beyond thicknesses of 100 nm, however, the grain structures increase in size and height, producing a pyramidal form and preferred orientation along the c-axis. The XRD results show that the films have a preferred orientation in the (002) plane. Furthermore, with the evolution of the film thickness the electrical resistivity decreases to a minimum of 1.6 × 10- 3 Ω cm for the film of 465 nm thickness. The doping with aluminum atoms produces an increase in concentration of charge carriers to around 8.8 × 10(19) cm- 3. All films exhibit high optical transmittance (above 85%) in the visible region. (AU)

FAPESP's process: 11/21345-0 - Thin hydrogenated amorphous carbon films also containing Halogens produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) and plasma immersion ion implantation and deposition (PIIID)
Grantee:Steven Frederick Durrant
Support Opportunities: Regular Research Grants