Langmuir Probe Measurements in a Grid-Assisted Magnetron Sputtering System

Author(s)

Sagas, Julio Cesar ^[1] ; Pessoa, Rodrigo Savio ^{[2, 3]} ; Maciel, Homero Santiago ^{[2, 3]}

Affiliation

^[1] Univ Estado Santa Catarina, Lab Plasmas Filmes & Superficies, BR-89219710 Joinville, SC - Brazil

^[2] ITA, Ctr Ciencia & Tecnol Plasmas & Mat PlasMat, BR-12228900 Sao Jose Dos Campos, SP - Brazil

^[3] Univ Brasil, BR-08230030 Sao Paulo, SP - Brazil

• Document type: Journal article
• Source: Brazilian Journal of Physics; v. 48, n. 1, p. 61-66, FEB 2018.
• Web of Science Citations: 0

Abstract

The grid-assisted magnetron sputtering is a variation of the magnetron sputtering commonly used for thin film deposition. In this work, Langmuir probe measurements were performed in such a system by using the grid under two basic and practical electrical conditions, i.e., floating and grounded. The results show that grounding the grid leads to an enhancement of the plasma confinement and to increases in both floating and plasma potential, as inferred from the probe characteristics. The grounded grid drains electrons from the plasma, acting as an auxiliary anode and reducing the plasma diffusion toward the chamber walls. For the same discharge current, the improved confinement results in a lower electron temperature when compared to floating condition, although the electron densities are comparable in both cases. (AU)

• FAPESP's process: 11/50773-0 - Center of excellence in physics and applications of plasmas
• Grantee: Ricardo Magnus Osório Galvão
• Support Opportunities: Research Projects - Thematic Grants