Advanced search
Start date
Betweenand
Related content
(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Low energy alpha particle tracks in CR-39 nuclear track detectors: Chemical etching studies

Full text
Author(s):
Oliveira, C. S. [1] ; Malheiros, B. [1, 2] ; Pires, K. C. C. [1] ; Assuncao, M. ; Guedes, S. [3] ; Correa, J. N. [4] ; Paschuk, S. A. [4]
Total Authors: 7
Affiliation:
[1] Univ Sao Paulo, Inst Fis, Dept Fis Nucl, BR-05508090 Sao Paulo - Brazil
[2] Eindhoven Univ Technol, Dept Chem Engn & Chem, Inst Complex Mol Syst, Eindhoven - Netherlands
[3] Univ Estadual Campinas, Inst Fis Gleb Wataghin, BR-13083859 Sao Paulo - Brazil
[4] Univ Tecnol Fed Parana, Campus Curitiba, BR-80230901 Curitiba, Parana - Brazil
Total Affiliations: 4
Document type: Journal article
Source: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SP; v. 995, APR 11 2021.
Web of Science Citations: 0
Abstract

The widely known CR-39 nuclear track detectors (NTDs) have been used to investigate the etch pits formed by alpha particles from a Am-241 source moderated to 1-2 MeV. The efficiencies of two available CR-39 plastic detectors, Lantrak and Baryotrak, have been studied as a function of the chemical etching time. The chemical etching solutions of the NaOH, KOH and NaOH+ethyl alcohol at 70 and 80 degrees C have been applied to build etch pit diameter growths as well as density curves. The obtained growth curves of etch pit diameters have been compared under these different etching conditions, showing similar general trends for Baryotrak and Lantrak detectors for etching at 70 degrees C. A slight divergence of the curves have been observed at 80 degrees C for etching times above 400 min, revealing a small variation in the bulk etch rates between the two detector types. The etch pit density curves for both detectors have also been studied, showing a plateau for all etching conditions except for NaOH+ethyl alcohol at 80 degrees C, in which there is a significant decrease in density after approximate to 600 min of etching. The results obtained with the protocols described in detail in this work show the pertinent precautions to be adopted in the chemical treatment of NTDs for the detection of alpha particle at low energies. In particular, the quantitative results highlight the limits of linear growth of pits and induction etching time for etch pits with diameters D=0 mu m (EIT0) and D=1 mu m (EIT1). (AU)

FAPESP's process: 19/07767-1 - Nuclear reactions with weakly-bound or cluster-structured radioactive and stable nuclei
Grantee:Leandro Romero Gasques
Support Opportunities: Research Projects - Thematic Grants