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Simulation and Fabrication of Silicon Nitride Microring Resonator by DUV Lithography

Author(s):
Cirino, Giuseppe A. ; Barea, Luis A. ; von Zuben, Antonio A. ; L'hermite, Herve ; Beche, Bruno ; De Sagazan, Olivier ; Frateschi, Newton ; M-Brahim, Tayeb ; IEEE
Total Authors: 9
Document type: Journal article
Source: 2016 31ST SYMPOSIUM ON MICROELECTRONICS TECHNOLOGY AND DEVICES (SBMICRO); v. N/A, p. 4-pg., 2016-01-01.
Abstract

This work reports the design and fabrication of silicon nitride-based microresonators by employing DUV optical lithography and ICP-RIE plasma etching. Microring devices with high Q factors provide high sensitivity and low detection limit, enabling their use in biochemical sensing applications. With these properties, the devices can be used to detect and quantify the biomolecules present in a homogeneous solution, by detecting an effective refractive index change, without using fluorescent labels. (AU)

FAPESP's process: 14/04748-2 - Coupled microresonators applied to signal processing and photonics integration
Grantee:Mário César Mendes Machado de Souza
Support Opportunities: Scholarships in Brazil - Doctorate
FAPESP's process: 08/57862-6 - NAMITEC
Grantee:Jacobus Willibrordus Swart
Support Opportunities: Research Projects - Thematic Grants