Multiuser equipment approved in grant 2012/50259-8: reactive ion etching
| Grant number: | 18/24380-0 |
| Support type: | Multi-user Equipment Program |
| Duration: | February 01, 2019 - January 31, 2026 |
| Field of knowledge: | Engineering - Electrical Engineering |
| Principal Investigator: | Antonio Helio de Castro Neto |
| Grantee: | Antonio Helio de Castro Neto |
| Home Institution: | Centro de Pesquisas Avançadas em Grafeno, Nanomateriais e Nanotecnologia (MackGrafe). Universidade Presbiteriana Mackenzie (UPM). Instituto Presbiteriano Mackenzie. São Paulo , SP, Brazil |
| Associated research grant: | 12/50259-8 - Graphene: photonics and opto-electronics: UPM-NUS collaboration, AP.SPEC |
| EMU web page: | Página do Equipamento Multiusuário não informada |
| Use scheduling: | E-mail de agendamento não informado |
Abstract
This equipment allows the manufacture of electro-optical devices using thin film deposition technique of atomic thickness. With it, it will be possible to deposit dielectric layers of the order of a few nanometers in capacitive structures based on two-dimensional materials. (AU)