Optimization of ARROW waveguide's fabrication steps for the application in optical...
Electrical Characterization, Simulation and Parameter Extraction of SOI MOS Nanowi...
Processing and characterization of high strength wear resistant materials
Grant number: | 00/10027-3 |
Support Opportunities: | Research Projects - Thematic Grants |
Start date: | July 01, 2001 |
End date: | December 31, 2008 |
Field of knowledge: | Engineering - Electrical Engineering - Electrical Materials |
Principal Investigator: | Ines Pereyra |
Grantee: | Ines Pereyra |
Host Institution: | Escola Politécnica (EP). Universidade de São Paulo (USP). São Paulo , SP, Brazil |
Associated scholarship(s): | 08/07111-4 - "Study of piezoelectric materials from the III-V family obtained by reactive sputtering",
BP.MS 08/08775-3 - RF MEMS Based on a-SiC:H and SIOxNy Obtained by PECVD at Low Temperatures, BP.PD |
Abstract
The main global of this project is to guarantee the continuity of the research that the group has been performing during the past ten years on the growth and characterization of amorphous and microcrystalline semiconducting and insulating thin films deposited by the RF-PEVCD technique. Previous studies will be deepened and promising areas, revealed by preliminary results, will be initiated. These will involve the deposition, characterization and optimization of the materials under study, as well as the development of devices and applications utilizing these films. Other techniques as sputtering and CVD for the deposition of the films will be implemented. To consolidate our research group, guarantying the experimental infrastructure and giving conditions to increase our human resources, by the implementation of postdoctoral fellowships, the coming of visiting professors and continuing with graduate students formation is also a goal of this research proposal. (AU)
Articles published in Agência FAPESP Newsletter about the research grant: |
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