| Grant number: | 05/03420-4 |
| Support Opportunities: | Regular Research Grants |
| Start date: | February 01, 2006 |
| End date: | February 29, 2008 |
| Field of knowledge: | Physical Sciences and Mathematics - Physics |
| Principal Investigator: | Elidiane Cipriano Rangel da Cruz |
| Grantee: | Elidiane Cipriano Rangel da Cruz |
| Host Institution: | Universidade Estadual Paulista (UNESP). Campus Experimental de Sorocaba. Sorocaba , SP, Brazil |
| City of the host institution: | Sorocaba |
Abstract
Amorphous carbon hydrogenated films, a-C:H, present potential applications due to particular properties as bio and hemocompatibility, high hardness, low friction coefficient, high electrical resistivity and optical transparency. The implementation of such applications is still hindered however by the low durability of the films. Premature peeling occurs due to the intense stress levels generated in the deposition process. Several studies presented in the last few years try to overcome such drawback varying the plasma excitation parameters (chemical composition, pressure, power, etc). Results demonstrate however that with decreasing slightly the stress level there is a strong fall in the hardness. The proposal of the present work is the application of hybrid deposition techniques which allow the reduction of the internal stress as well as the enhancement of the film adhesion to the substrate. Radiofrequency plasmas (13.56 MHz) excited from organic compounds (acetylene, methane and hexamethyldisiloxane) and their mixtures with noble and reactive gases (nitrogen, argon and sulfur hexafluoride) will be employed to prepare a-C:H films. Besides chemical composition, the influence of the plasma excitation pressure and power on the film properties will be evaluated. Studies concerning the deposition of films upon ion bombardment of higher energies will also be conducted through the plasma immersion ion implantation and deposition method, PIIID. In this approach, there is dilution of the substrate with film constituents, reducing the stress level caused by the material mismatching and improving adhesion. This study will be performed varying the chemical composition of the plasma and also the high voltage pulse parameters (frequency and duty cycle)... (AU)
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