Scientific MUE: acquisition of a 100 kV electron beam nanolithography system for h...
Reducing phase noise of on-chip optical parametric oscillators
Optimization of Plasma Etching of Lithium Niobate and Silicon Nitride Thin Film
Grant number: | 24/13366-8 |
Support Opportunities: | Scholarships in Brazil - Master |
Start date: | October 01, 2024 |
End date: | May 31, 2026 |
Field of knowledge: | Physical Sciences and Mathematics - Physics - General Physics |
Principal Investigator: | Felippe Alexandre Silva Barbosa |
Grantee: | Amanda Vettorazzo Halsman |
Host Institution: | Instituto de Física Gleb Wataghin (IFGW). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil |
Associated research grant: | 18/03474-7 - Nonclassical states of light on chip, AP.JP |
Abstract This project aims to prepare and measure entanglement states between the twin beams generated by an integrated optical parametric oscillator (OPO) made with lithium niobate thin films and operating above threshold. | |
News published in Agência FAPESP Newsletter about the scholarship: | |
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