Optical pattern generator for lithography masks and direct write
Advanced magnetic materials and new characterization techniques
Scientific MUE: acquisition of a 100 kV electron beam nanolithography system for h...
Multi-User Equipment approved in the grant 2017/10581-1: total reflexion X-rays fl...
Topology and Transport in Chiral Magnetoelectric Nanomaterials under Extreme Condi...
Effects of Mn and Gd incorporation on the electrical conductivity of Ga(1-x)M(x)As...