Optical pattern generator for lithography masks and direct write
Multi-User Equipment approved in the grant 2017/10581-1: total reflexion X-rays fl...
Advanced magnetic materials and new characterization techniques
Scientific MUE: Acquisition of a 100 kV electron beam nanolithography system for h...
Nano-optics of polaritons in two-dimensional crystals and at the metal/dielectric ...
Topology and Transport in Chiral Magnetoelectric Nanomaterials under Extreme Condi...