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Optical pattern generator for lithography masks and direct write

Grant number: 09/54045-0
Support type:Multi-user Equipment Program
Duration: August 01, 2010 - October 31, 2013
Field of knowledge:Engineering - Electrical Engineering
Principal Investigator:Roberto Ricardo Panepucci
Grantee:Roberto Ricardo Panepucci
Home Institution: Centro de Pesquisas Renato Archer (CENPRA). Ministério da Ciência, Tecnologia, Inovações e Comunicações (Brasil). Campinas , SP, Brazil
EMU web page: Página do Equipamento Multiusuário não informada
Use scheduling: E-mail de agendamento não informado

Abstract

This request is aimed at the acquisition of a system for the generation of optical patterns for the lithographic fabrication of structures to be used in novel nanometer- and micrometer-scale devices. There is a gap in this field in Brazil, which currently imports lithography masks and does not possess the technology to produce such devices by direct-write lithography. There are a number of associated projects, with various objectives: The National Institute of Science and Technology denominated Namitec addresses the use of micrometrics and nanometrics in the area of information and communication technology. The Namitec researchers approach this theme in a broad manner, including applications for wireless sensor networks, projects involving integrated circuits, the development of auxiliary tools for the electronic design automation project, the development of semiconductor devices, and, above all, microsensors, materials, and techniques for the fabrication of devices. The Photosensitive Materials and Applications project is aimed at coordinating research activities focusing on photosensitive materials in order to deepen knowledge of the mechanisms and processes that allow these materials to respond to light, to use this knowledge in improving the performance of such materials, when possible, and to develop applications such as image/signal processing, the measurement of vibrations etc., as well as the fabrication of diffractive optical components and two- or threedimensional structures on the micro or nano scale. The Propagation of Electromagnetic Waves in Complex Structures project has the objective of producing structures based on artificial materials, including metamaterials, and complex materials for the production of surface plasmon polaritons (SPPs), the investigation of electromagnetic cloaking applications in particular. In the case of SPP production, the objective is the investigation of nanostructures for applications in optical sensing and communications. (AU)

Scientific publications
(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)
MALHEIROS-SILVEIRA, GILLIARD N.; FINARDI, CELIO A.; BURGER, TALITA S.; VAN ETTEN, ELIANA A. M. A.; DA SILVA, RICARDO C. G.; COELHO, ARTUR V. P.; DALTRINI, ANDRE M.; PANEPUCCI, ROBERTO R. High-resolution notch filters and diplexers based on SU-8 inverted rib waveguides. APPLIED OPTICS, v. 58, n. 27, p. 7331-7335, SEP 20 2019. Web of Science Citations: 0.
RAMIREZ, JHONATTAN C.; SCHIANTI, JULIANA N.; SOUTO, DENIO E. P.; KUBOTA, LAURO T.; HERNANDEZ-FIGUEROA, HUGO E.; GABRIELLI, LUCAS H. Dielectric barrier discharge plasma treatment of modified SU-8 for biosensing applications. BIOMEDICAL OPTICS EXPRESS, v. 9, n. 5, p. 2168-2175, MAY 1 2018. Web of Science Citations: 3.

Please report errors in scientific publications list by writing to: cdi@fapesp.br.