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Nanostructural characterization of Group IV thin films deposited by magnetron sputtering

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Author(s):
Eliane de Fátima Chinaglia
Total Authors: 1
Document type: Doctoral Thesis
Press: São Paulo.
Institution: Universidade de São Paulo (USP). Instituto de Física (IF/SBI)
Defense date:
Examining board members:
Ivette Frida Cymbaum Oppenheim; Carlos Alberto Achete; Israel Jacob Rabin Baumvol; Augusto Camara Neiva; Shigueo Watanabe
Advisor: Ivette Frida Cymbaum Oppenheim
Abstract

Correlations type processing-structure-property of films have been the subject of extensive studies for the last several decades, both from the point of view of science and technology. More recently, growing attention has been given to ever-thinner films, especially to satisfy the needs of newer technologies. To better understand the correlation processing-structure, many researchers have proposed Structure Zone Models for films typically a few to a few tens of micrometers thick. In this work, we propose Structure Zone Models for Group IV-B (Ti, Zr and Hf) thin films and study the microstructure forming mechanisms of the films. During the development of our work, intriguing grain aggregates several micrometers Jorge and with fractal geometry were observed in the Zr films. The geometrical characteristics of the aggregates, their possible origin and evolution mechanisms are also considered here. (AU)