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(Reference retrieved automatically from Web of Science through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Near-infrared light emission of Er3+-doped zirconium oxide thin films: An optical, structural and XPS study

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Author(s):
Clabel, J. L. H. [1] ; Rivera, V. A. G. [2] ; Li, M. Siu [2] ; Nunes, L. A. O. [2] ; Leite, E. R. [3] ; Schreiner, W. H. [4] ; Marega, Jr., E. [2]
Total Authors: 7
Affiliation:
[1] Univ Fed Sao Carlos, Dept Fis, BR-13565905 Sao Carlos, SP - Brazil
[2] Univ Sao Paulo, Inst Fis Sao Carlos, BR-13560970 Sao Carlos, SP - Brazil
[3] Univ Fed Sao Carlos, Lab Interdisciplinar Eletroquim & Ceram, BR-13565905 Sao Carlos, SP - Brazil
[4] UFPR, Dept Fis, BR-81531980 Curitiba, Parana - Brazil
Total Affiliations: 4
Document type: Journal article
Source: Journal of Alloys and Compounds; v. 619, p. 800-806, JAN 15 2015.
Web of Science Citations: 9
Abstract

This paper investigates the near-infrared emission and structural properties of Er3+-doped zirconium oxide thin films modified with a fixed content of zinc oxide. The films were obtained by electron beam deposition on Si(100) substrates, followed by a thermal treatment with or without a controlled oxygen flow. The samples were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and energy dispersive X-ray spectroscopy (EDX). Scanning electron microscopy (SEM) was used to evaluate the surface morphology, distributions and size of the grains in the films. The results confirmed significant changes in these films from thermal treatment with or without oxygen flow. Fourier transform infrared spectroscopy (FOR) was used to analyze the absorption bands of the films. The photoluminescence (PL) measurement and I-4(13/2) -> I-4(15/2) lifetime was measured under 980 nm near-infrared excitation. The effects of thermal treatment as well as the concentration of Er2O3 on the PL emission intensity and lifetime in the near-infrared region (from the I-4(13/2) -> I-4(15/2) radiative transition) were studied. Thermal treatment under a controlled atmosphere increased the PL emission intensity due to a diminution of the residual OH groups, as confirmed by the XPS and analysis and FTIR spectroscopy. The film modified with 3 mol% of Er2O3 content annealed in oxygen flow shows an emission intensity of two orders of magnitude greater than the annealed film without oxygen flow at 1550 nm, nevertheless, the bandwidth was practically the same (7.6 nm) in both cases. Published by Elsevier B.V. (AU)

FAPESP's process: 09/08978-4 - Planar Waveguide for Telecommunications from Plasmons
Grantee:Victor Anthony Garcia Rivera
Support Opportunities: Scholarships in Brazil - Post-Doctoral