| Full text | |
| Author(s): |
Dias, V. M.
[1, 2]
;
Chiappim, W.
[3]
;
Fraga, M. A.
[4]
;
Maciel, H. S.
[1, 5]
;
Marciano, F. R.
[6]
;
Pessoa, R. S.
[1, 5]
Total Authors: 6
|
| Affiliation: | [1] Inst Tecnol Aeronaut, Lab Plasmas & Proc, BR-12228900 Sao Jose Dos Campos, SP - Brazil
[2] Univ Vale Paraiba, Lab Nanotecnol & Proc Plasma, BR-12244000 Sao Jose Dos Campos, SP - Brazil
[3] Univ Aveiro, I3N, Dept Fis, Campus Univ Santiago, P-3810193 Aveiro - Portugal
[4] Univ Fed Sao Paulo, Inst Ciencia & Tecnol, BR-12231280 Sao Jose Dos Campos, SP - Brazil
[5] Univ Brasil, Inst Ciencia & Tecnol, BR-08230030 Sao Paulo, SP - Brazil
[6] Univ Fed Piaui, BR-64049550 Teresina, PI - Brazil
Total Affiliations: 6
|
| Document type: | Journal article |
| Source: | MATERIALS RESEARCH EXPRESS; v. 7, n. 7 JUL 2020. |
| Web of Science Citations: | 0 |
| Abstract | |
Titanium dioxide (TiO2) and aluminum oxide (Al2O3) thin films, with thicknesses around 100 nm, were grown on commercial pure- and resin-coated Al substrates using the atomic layer deposition (ALD). A comprehensive and comparative study of corrosion protection was carried out by linear sweep voltammetry (LSV) and electrochemical impedance spectroscopy (EIS) measurements for a set of six samples: two reference samples (Al-bare and Al-resin), and four ALD coated samples (Al-TiO2, Al-Al2O3, Al-resin-TiO2, and Al-resin-Al2O3). The LSV and EIS results display good mutual agreement, indicating a higher protection efficiency of all ALD-coated samples after immersion in NaCl. When compared to Al-bare, all ALD coated samples (TiO2 or Al2O3) showed a corrosion inhibition enhancement factor of 99%. Besides, our results demonstrated that Al-resin+Al2O3 has 24.95% and 33.40% more corrosion inhibition than Al-Al2O3 and Al-resin, respectively. EIS data were fitted by an equivalent electric circuit (EEC). The Nyquist and Bode plots from the experiments showed that ALD films are a potential candidate for altering/improving commercial resin-coated Al cans. (AU) | |
| FAPESP's process: | 18/01265-1 - Synthesis and microbiological analysis of polymer substrates coated with TiO2 and / or Al2O3 ultra-thin films by atomic layer deposition technology |
| Grantee: | Rodrigo Savio Pessoa |
| Support Opportunities: | Regular Research Grants |
| FAPESP's process: | 14/18139-8 - Growth and doping studies of mono-crystalline CVD-diamond, dye-colored via discharge of high-power mW 2.45 GHz |
| Grantee: | Mariana Amorim Fraga |
| Support Opportunities: | Scholarships in Brazil - Post-Doctoral |
| FAPESP's process: | 16/17826-7 - Fabrication of MOS solar cells using structures Al/TiO2/SiO2/Si |
| Grantee: | William Chiappim Junior |
| Support Opportunities: | Scholarships in Brazil - Post-Doctoral |