| Grant number: | 14/21594-9 |
| Support Opportunities: | Regular Research Grants |
| Start date: | August 01, 2015 |
| End date: | October 31, 2017 |
| Field of knowledge: | Physical Sciences and Mathematics - Physics - Condensed Matter Physics |
| Principal Investigator: | Steven Frederick Durrant |
| Grantee: | Steven Frederick Durrant |
| Host Institution: | Instituto de Ciência e Tecnologia. Universidade Estadual Paulista (UNESP). Campus de Sorocaba. Sorocaba , SP, Brazil |
| City of the host institution: | Sorocaba |
Abstract
The deposition of amorphous chloinated thin films and the chlorination of surfaces in plasmas have diverse applications, amongst others,in biomaterials, the modification of fabric, and in the production of hydrogenated silicon films with excellent electrical characteristics. The present proposal deals first with the production of chlorinated surfaces using plasmas and the study of the chemical structure and the stoichiometry of these surfaces as a function of the system parameters, such as the gases used and their flow rates, the applied power and the treatment time. The influences of the chemical structure on properties such as morphology, roughness, and contact angle will be investigated. A second line of study is the production of amorphous hydrogenated chlorinated carbon and similar films by PECVD. Thus, a-C:H:Cl, a-C:H:N:Cl and a-C:H:Si:Cl films may be produced from plasmas fed mixtures such as C2H5OH and chlorinated comonomers such as CHCl3 or CCl4, or monomers, such as C2H2Cl4, with or without a plasmogenic gas. Concerning the films, their chemical structure and composition will be examined using FTIR (Fourier Transform Infrared Spectroscopy) and X-ray Photo-electron Spectroscopy (XPS) as a function of the system parameters (types of gas, flow rates, applied power, etc.). Part of this proposal is to purchase an optical profilemeter for rapid and exact film thickness determinations. Atomic Force Microscopy will be used to examine the morphology and roughness of the treated surfaces and of the films deposited. For the films, Ultraviolet-visible spectroscopy (UVS)will also be used (Perkin Elmer, model Lambda 750), in the wavelength range of 200 nm to 3300 nm, to obtain transmission spectra. From these spectra and film thickness measurements, refractive indices, absorption coefficients and optical gaps of the film material will be calculated. the use of semi-empirical models will permit elucidation of the connection between the chemical structure of the chlorinated films and their optical properties. (AU)
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