Construction of solar cells based in crystalline titanium dioxide thin films doped with nitrogen

• Grant number: 09/15031-3
• Support Opportunities: Scholarships in Brazil - Doctorate
• Start date: March 01, 2010
• End date: July 31, 2013
• Field of knowledge: Engineering - Electrical Engineering - Electrical Materials
• Principal Investigator: Marcos Massi
• Grantee: Diego Alexandre Duarte
• Host Institution: Divisão de Ciências Fundamentais (IEF). Instituto Tecnológico de Aeronáutica (ITA). Ministério da Defesa (Brasil). São José dos Campos , SP, Brazil

Abstract

Recently, with the advancement and interest in the utilization of other forms of energy, such as renewables, it becomes increasingly essential to development of devices that allow the use of these alternative sources. Thus, solar cells stand out in this technological environment, due to its facility to be used in any part of the planet Earth, once the rate of energy reaching the planet must be stable over the next 10 billion years. Several systems have been and are continuously developed, aiming the conversion of solar energy into electrical energy for many different applications. The cells of titanium dioxide doped with nitrogen stand out in this market due to its low cost, easy to assemble and by do not present any kind of toxicity to humans or the environment. Many processes are used to process cells of N-TiO2, however, the processes dominated by the plasma engineering present itself as a versatile and efficient tool, in the production of these devices, because it is a technology which has high reproducibility and have low rates of aggression to the environment, when compared to the traditional chemical processes. In this work will be carried out the construction and characterization of such solar cells based on N-TiO2 by plasma process, where the work will be carried out since the films production of N-TiO2, SnO2 and Pt until the assembly and characterization of the devices, in order to find a direct correlation between the efficiency of the cells with the parameters of the plasma processing.

Scientific publications

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

DIEGO ALEXANDRE DUARTE; MARCOS MASSI. Incorporation of N in the TiO2 Lattice Versus Oxidation of TiN: Influence of the Deposition Method on the Energy Gap of N-Doped TiO2 Deposited by Reactive Magnetron Sputtering. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 20, n. 2, p. 549-554, 2017-03-02. (09/15031-3)