Numerical simulation of HFCVD process used for diamond growth

Divani C. Barbosa; Hélcio F. V. Nova; Mauricio R. Baldan

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(Reference retrieved automatically from SciELO through information on FAPESP grant and its corresponding number as mentioned in the publication by the authors.)

Numerical simulation of HFCVD process used for diamond growth

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Author(s):	Divani C. Barbosa ^[1] ; Hélcio F. V. Nova ^[2] ; Mauricio R. Baldan ^[3] Total Authors: 3
Affiliation:	^[1] Instituto Nacional de Pesquisas Espaciais ^[2] Instituto Nacional de Pesquisas Espaciais ^[3] Instituto Nacional de Pesquisas Espaciais Total Affiliations: 3
Document type:	Journal article
Source:	Brazilian Journal of Physics; v. 36, p. 313-316, 2006-06-00.
Abstract
Hot-filament chemical vapour deposition (HFCVD) is a common method employed for diamond deposition. Typically in this method a dilute mixture of carbon containing gas such as methane in hydrogen is thermally activated at sub atmospheric pressures by a hot filament. Due to the filament-substrate proximity, large temperature variation across the substrate is possible. In this work we investigate the role of fluid flow and heat transfer from the filament to substrate in determining the quality of diamond growth. The commercial software CFX was used to calculate velocity field, temperature distribution and fluid flow. A vortex was identified on the substrate. (AU)

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