Thin hydrogenated amorphous carbon films also containing Halogens produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) and plasma immersion ion implantation and deposition (PIIID)

• Grant number: 11/21345-0
• Support Opportunities: Regular Research Grants
• Start date: April 01, 2012
• End date: March 31, 2014
• Field of knowledge: Engineering - Materials and Metallurgical Engineering - Nonmetallic Materials
• Principal Investigator: Steven Frederick Durrant
• Grantee: Steven Frederick Durrant
• Host Institution: Universidade Estadual Paulista (UNESP). Campus Experimental de Sorocaba. Sorocaba , SP, Brazil

Abstract

Thin hydrogenated carbon films also containing halogens will be produced by Plasma Enhanced Chemical Vapor Deposition (PECVD) and Plasma Immersion Ion Implantation and Deposition (PIIID), a-C:H:X, where X is a halogen, and similar films such as a-C:H:X:Si. The chemical structure and composition of these films will be examined by X-ray Photoelectron Spectrocopy (XPS) and Fourier Transform Infrared Spectroscopy (FTIR). Optical properties of the films, such as referactive index, absorption coefficient and optical gap, will be calculated from Ultraviolet-visible-near infrared spectroscopic data. The purchase of an accessory to permit the accumulation of reflectance spectra with the spectrophotometer, that will permit these calculations in the absence of interference fringes in the transmission spectra, which is a restriction on the common method, is sought. The differences in the chemical structure and composition of the films and the optical properties of the materials obtained by the two techniques will be examined. Surface contact angles will also be measured. (AU)

Scientific publications

(5)

(References retrieved automatically from Web of Science and SciELO through information on FAPESP grants and their corresponding numbers as mentioned in the publications by the authors)

ÉRICA PEREIRA DA SILVA; MICHEL CHAVES; STEVEN FREDERICK DURRANT; PAULO NORONHA LISBOA-FILHO; JOSÉ ROBERTO RIBEIRO BORTOLETO. Morphological and electrical evolution of ZnO: Al thin filmsdeposited by RF magnetron sputtering onto glass substrates. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 17, n. 6, p. 1384-1390, 2014-12-00. (11/21345-0)

RANGEL, ELIDIANE C.; DE SOUZA, EDUARDO S.; DE MORAES, FRANCINE S.; DUEK, ELIANA A. R.; LUCCHESI, CAROLINA; SCHREINER, WIDO H.; DURRANT, STEVEN F.; CRUZ, NILSON C.. Cell Adhesion to Plasma-Coated PVC. SCIENTIFIC WORLD JOURNAL, 2014. (05/03420-4, 11/21345-0)

DA SILVA, ERICA PEREIRA; CHAVES, MICHEL; DURRANT, STEVEN FREDERICK; LISBOA-FILHO, PAULO NORONHA; RIBEIRO BORTOLETO, JOSE ROBERTO. Morphological and Electrical Evolution of ZnO:Al Thin Films Deposited by RF Magnetron Sputtering onto Glass Substrates. MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, v. 17, n. 6, p. 1384-1390, NOV-DEC 2014. (11/21345-0)

BORTOLETO, J. R. R.; CHAVES, M.; ROSA, A. M.; DA SILVA, E. P.; DURRANT, S. F.; TRINO, L. D.; LISBOA-FILHO, P. N.. Growth evolution of self-textured ZnO films deposited by magnetron sputtering at low temperatures. Applied Surface Science, v. 334, p. 210-215, APR 15 2015. (11/21345-0)

RANGEL, ELIDIANE C.; DE SOUZA, EDUARDO S.; DE MORAES, FRANCINE S.; DUEK, ELIANA A. R.; LUCCHESI, CAROLINA; SCHREINER, WIDO H.; DURRANT, STEVEN F.; CRUZ, NILSON C.. Cell Adhesion to Plasma-Coated PVC. SCIENTIFIC WORLD JOURNAL, v. N/A, p. 9-pg., 2014-01-01. (11/21345-0, 05/03420-4)