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Modeling of silicon stacked nanowire and nanosheet transistors at high temperatures

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Author(s):
Cerdeira, Antonio ; Estrada, Magali ; Mariniello Da Silva, Genaro ; Calcade Rodrigues, Jaime ; Pavanello, Marcelo A. ; IEEE
Total Authors: 6
Document type: Journal article
Source: 2022 IEEE LATIN AMERICAN ELECTRON DEVICES CONFERENCE (LAEDC); v. N/A, p. 4-pg., 2022-01-01.
Abstract

In this work, we demonstrate that the Symmetric Doped Double-Gate Model (SDDGM), previously validated for modeling FinFETs, stacked nanowire, and nanosheet transistors at room temperature, can be extended for modeling stacked nanowire and nanosheet transistors at high temperatures. The modeled results are validated by comparison with experimental data. (AU)

FAPESP's process: 19/15500-5 - Atomistic simulation of nanowire MOSFETs electrical properties
Grantee:Marcelo Antonio Pavanello
Support Opportunities: Regular Research Grants