| Full text | |
| Author(s): |
Mazzi, Felipe Boechat
;
Silva Barbosa, Felippe Alexandre
;
IEEE
Total Authors: 3
|
| Document type: | Journal article |
| Source: | 2023 INTERNATIONAL CONFERENCE ON OPTICAL MEMS AND NANOPHOTONICS, OMN AND SBFOTON INTERNATIONAL OPTICS AND PHOTONICS CONFERENCE, SBFOTON IOPC; v. N/A, p. 2-pg., 2023-01-01. |
| Abstract | |
Thin-film lithium niobate (TFLN) is a promising candidate for photonic-based quantum information technology. This platform combines large nonlinear and electro-optical coefficients with the tight confinement and reduced footprint characteristic of integrated devices. Nonetheless, current high-performance devices in TFLN generally rely on the use of hydrogen-silsesquioxane (HSQ) resist, or on silicon dioxide hard-masks, adding complexity to the fabrication process. Here, we fabricate and characterize optical resonators in TFLN using readily available organic deep UV resist. This process constitutes an alternative for more accessible microfabrication of TFLN photonic devices. (AU) | |
| FAPESP's process: | 18/03474-7 - Nonclassical states of light on chip |
| Grantee: | Felippe Alexandre Silva Barbosa |
| Support Opportunities: | Research Grants - Young Investigators Grants |
| FAPESP's process: | 21/12438-7 - Microfabrication and optimization of lithium niobate integrated optical cavities |
| Grantee: | Felipe Boechat Mazzi |
| Support Opportunities: | Scholarships in Brazil - Master |
| FAPESP's process: | 18/25339-4 - Integrated photonics devices |
| Grantee: | Newton Cesario Frateschi |
| Support Opportunities: | Research Projects - Thematic Grants |