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Acquisition of a raith e-line system of electron beam lithography: nanofabrication of new generations of photonic and electronic components / circuits

Grant number: 09/54064-4
Support Opportunities:Multi-user Equipment Program
Duration: August 01, 2010 - January 31, 2013
Field of knowledge:Physical Sciences and Mathematics - Physics - Condensed Matter Physics
Principal Investigator:Newton Cesario Frateschi
Grantee:Newton Cesario Frateschi
Host Institution: Centro de Componentes Semicondutores (CCS). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
As informações de acesso ao Equipamento Multiusuário são de responsabilidade do Pesquisador responsável
EMU web page: Página do Equipamento Multiusuário não informada
Type of equipment: Tipo de Equipamento Multiusuário não informado
Manufacturer: Fabricante não informado
Model: Modelo não informado

Abstract

We propose the purchase and installation of a ultra-high-resolution electron beam lithography system at the Center for Semiconductor Components - UNICAMP. This system will be integrated into the already established microfabrication and nanofabrication infraestructure in the laboratory, creating a center of excellence for research and development in the area of newcomponents for integrated electronics and photonics. Such components can have great impact on developing disruptive technologies for the processing, storage, and transmission of information. Therefore, this project has the full support of two national institutes of science and technology, one in telecommunications and the other in quantum information. (AU)

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