Acquisition of a raith e-line system of electron beam lithography: nanofabrication of new generations of photonic and electronic components / circuits

• Grant number: 09/54064-4
• Support Opportunities: Multi-user Equipment Program
• Start date: August 01, 2010
• End date: January 31, 2013
• Field of knowledge: Physical Sciences and Mathematics - Physics - Condensed Matter Physics
• Principal Investigator: Newton Cesario Frateschi
• Grantee: Newton Cesario Frateschi
• Host Institution: Centro de Componentes Semicondutores (CCS). Universidade Estadual de Campinas (UNICAMP). Campinas , SP, Brazil
• EMU web page: Página do Equipamento Multiusuário não informada
• Type of equipment: Tipo de Equipamento Multiusuário não informado
• Manufacturer: Fabricante não informado
• Model: Modelo não informado

Abstract

We propose the purchase and installation of a ultra-high-resolution electron beam lithography system at the Center for Semiconductor Components - UNICAMP. This system will be integrated into the already established microfabrication and nanofabrication infraestructure in the laboratory, creating a center of excellence for research and development in the area of newcomponents for integrated electronics and photonics. Such components can have great impact on developing disruptive technologies for the processing, storage, and transmission of information. Therefore, this project has the full support of two national institutes of science and technology, one in telecommunications and the other in quantum information. (AU)