Study and optimization of RF MEMS manufactured in CMOS technology releasing process

• Grant number: 14/18170-2
• Support Opportunities: Scholarships in Brazil - Scientific Initiation
• Start date: November 01, 2014
• End date: July 31, 2015
• Field of knowledge: Engineering - Electrical Engineering - Electrical, Magnetic and Electronic Circuits
• Principal Investigator: Gustavo Pamplona Rehder
• Grantee: Rafael Martins Manzano Silva
• Host Institution: Escola Politécnica (EP). Universidade de São Paulo (USP). São Paulo , SP, Brazil
• Associated research grant: 11/18167-3 - RF MEMS for millimetric waves using commercial CMOS process, AP.JP

Abstract

The present work aims at studying and optimizing the release process of RF MEMS fabricated with a commercial CMOS technology under development at LME. We intend to study the etching mechanisms of RIE and optimize this process. The HF vapor etching will also be studied aiming at improving the reproducibility of the process and eliminating residues that appear after this process. An alternative process that uses wet etching and supercritical drying will also be tested.