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Study and optimization of RF MEMS manufactured in CMOS technology releasing process

Grant number: 14/18170-2
Support type:Scholarships in Brazil - Scientific Initiation
Effective date (Start): November 01, 2014
Effective date (End): July 31, 2015
Field of knowledge:Engineering - Electrical Engineering - Electrical, Magnetic and Electronic Circuits
Principal Investigator:Gustavo Pamplona Rehder
Grantee:Rafael Martins Manzano Silva
Home Institution: Escola Politécnica (EP). Universidade de São Paulo (USP). São Paulo , SP, Brazil
Associated research grant:11/18167-3 - RF MEMS for millimetric waves using commercial CMOS process, AP.JP


The present work aims at studying and optimizing the release process of RF MEMS fabricated with a commercial CMOS technology under development at LME. We intend to study the etching mechanisms of RIE and optimize this process. The HF vapor etching will also be studied aiming at improving the reproducibility of the process and eliminating residues that appear after this process. An alternative process that uses wet etching and supercritical drying will also be tested.